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Plasma etching in microdevice fabrication : thin film and process integration aspects
URI:
http://urn.fi/URN:NBN:fi:bib:me:W00080532700
author
Franssila, Sami
inLanguage
en
isPartOf
Fennica
name
Plasma etching in microdevice fabrication : thin film and process integration aspects
P60049
<http://rdaregistry.info/termList/RDAContentType/1020>
Instances
1995 : Teknillisten tieteiden akatemia
View this in Finna
Plasma etching in microdevice fabrication : thin film and process integration aspects
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00080532700
datePublished
1995
description
kuvitettu
Nimiösivulla myös: VTT Electronics. - Tiivistelmä ja 6 erip. - Tiivistelmä ilm. myös erillisenä
identifier
propertyID:
FI-FENNI
value:
435695
propertyID:
FI-MELINDA
value:
000805327
propertyID:
skl
value:
fx435695
isbn
9516664504
isPartOf
Acta polytechnica Scandinavica. Physics
Fennica
name
Plasma etching in microdevice fabrication : thin film and process integration aspects
numberOfPages
41, [36] s.
P60048
<http://rdaregistry.info/termList/RDACarrierType/1049>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1007>
publication
location:
Espoo
organizer:
Teknillisten tieteiden akatemia
publisher
Teknillisten tieteiden akatemia
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