Ultrahigh vacuum plasma oxidation in the fabrication of ultrathin silicon dioxide films

URI: http://urn.fi/URN:NBN:fi:bib:me:W00022510300
author
contributor
inLanguage
  • en
isPartOf
name
  • Ultrahigh vacuum plasma oxidation in the fabrication of ultrathin silicon dioxide films
P60049

Instances

View this in Finna

Ultrahigh vacuum plasma oxidation in the fabrication of ultrathin silicon dioxide films

URI: http://urn.fi/URN:NBN:fi:bib:me:I00022510300
datePublished
  • 2000
description
  • kuvitettu
identifier
  • propertyID: FI-FENNI value: 670472
  • propertyID: FI-MELINDA value: 000225103
  • propertyID: skl value: fx670472
isbn
  • 9512251469
isPartOf
name
  • Ultrahigh vacuum plasma oxidation in the fabrication of ultrathin silicon dioxide films
numberOfPages
  • 2, x, 88 s.
P60048
P60050
publication
  • location: Espoo organizer: Teknillinen korkeakoulu
publisher

Download this resource as RDF: