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Development of atomic layer deposition processes for nanotechnology applications
URI:
http://urn.fi/URN:NBN:fi:bib:me:W01222990400
about
atomikerroskasvatus
nanotekniikka
author
Bosund, Markus
contributor
Aalto-yliopiston sähkötekniikan korkeakoulu. Elektroniikan ja nanotekniikan laitos
inLanguage
en
isPartOf
Fennica
name
Development of atomic layer deposition processes for nanotechnology applications
P60049
<http://rdaregistry.info/termList/RDAContentType/1020>
Instances
-, e-book
2018 : Aalto-yliopisto
Development of atomic layer deposition processes for nanotechnology applications
URI:
http://urn.fi/URN:NBN:fi:bib:me:I01222990401
bookFormat
<http://schema.org/EBook>
isPartOf
Fennica
University of Oulu, Department Information Processing Science. Series A, Research papers
name
Development of atomic layer deposition processes for nanotechnology applications
url
<http://urn.fi/URN:ISBN:978-952-60-7859-5>
Development of atomic layer deposition processes for nanotechnology applications
URI:
http://urn.fi/URN:NBN:fi:bib:me:I01222990400
datePublished
2018
description
Artikkeliväitöskirjan yhteenveto-osa ja 5 eripainosta.
identifier
propertyID:
FI-MELINDA
value:
012229904
isbn
9789526078588
isPartOf
Fennica
University of Oulu, Department Information Processing Science. Series A, Research papers
name
Development of atomic layer deposition processes for nanotechnology applications
numberOfPages
x, 49 sivua, 29 sivua useina numerointijaksoina
P60048
<http://rdaregistry.info/termList/RDACarrierType/1048>
<http://rdaregistry.info/termList/RDACarrierType/1049>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1007>
publication
location:
Helsinki
organizer:
Aalto-yliopisto
publisher
Aalto-yliopisto
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