Thermal and plasma-enhanced atomic layer deposition : the study of and employment in various nanotechnology applications

URI: http://urn.fi/URN:NBN:fi:bib:me:W00721282900
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  • Thermal and plasma-enhanced atomic layer deposition :
  • Thermal and plasma-enhanced atomic layer deposition : the study of and employment in various nanotechnology applications
P60049

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Thermal and plasma-enhanced atomic layer deposition : the study of and employment in various nanotechnology applications

URI: http://urn.fi/URN:NBN:fi:bib:me:I00721282901
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  • Julkaistu myös painettuna
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  • Thermal and plasma-enhanced atomic layer deposition : the study of and employment in various nanotechnology applications

Thermal and plasma-enhanced atomic layer deposition :

URI: http://urn.fi/URN:NBN:fi:bib:me:I00721282902
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  • 9789526062365
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  • Thermal and plasma-enhanced atomic layer deposition :

Thermal and plasma-enhanced atomic layer deposition : the study of and employment in various nanotechnology applications

URI: http://urn.fi/URN:NBN:fi:bib:me:I00721282900
bookFormat
datePublished
  • 2015
description
  • Artikkeliväitöskirjan yhteenveto-osa.
  • Nimeke nimiösivulta.
  • Nimiösivulla myös: Aalto University School of Electrical Engineering, Department of Micro- and Nanosciences, Nanotechnology Group.
identifier
  • propertyID: FI-MELINDA value: 007212829
isbn
  • 9789526062372
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name
  • Thermal and plasma-enhanced atomic layer deposition : the study of and employment in various nanotechnology applications
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  • 1 verkkoaineisto (125 s.)
P60048
P60050
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  • location: Helsinki organizer: Aalto-yliopisto
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