Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

URI: http://urn.fi/URN:NBN:fi:bib:me:I00621052901

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Julkaistu myös painettuna ISBN 978-952-10-8806-3 (nid.)

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Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

URI: http://urn.fi/URN:NBN:fi:bib:me:I00621052801

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Yhteenveto-osa julkaistu myös verkkoaineistona ISBN 978-952-10-8807-0 (PDF)

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Fennica

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Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

URI: http://urn.fi/URN:NBN:fi:bib:me:I00621052802

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<http://schema.org/EBook>

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Fennica

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Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

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<http://urn.fi/URN:ISBN:978-952-10-8807-0>

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Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

URI: http://urn.fi/URN:NBN:fi:bib:me:I00621052800

datePublished

2013

description

Artikkeliväitöskirjan yhteenveto-osa ja 6 eripainosta.
kuvitettu
Nimiösivulla myös: Laboratory of Inorganic Chemistry, Department of Chemistry, Faculty of Science, University of Helsinki, Finland.
Tiivistelmä ja 6 erip.

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propertyID: FI-FENNI value: 1024993
propertyID: FI-MELINDA value: 006210528
propertyID: skl value: fx1024993

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9789521088063

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Fennica

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Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

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68, [55] sivu

P60048

<http://rdaregistry.info/termList/RDACarrierType/1049>

P60050

<http://rdaregistry.info/termList/RDAMediaType/1007>

publication

location: Helsinki organizer: Helsingin yliopisto

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Helsingin yliopisto

View this in Finna

Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

URI: http://urn.fi/URN:NBN:fi:bib:me:I00621052900

bookFormat

<http://schema.org/EBook>

datePublished

2013

description

Artikkeliväitöskirjan yhteenveto-osa.
Nimeke PDF-nimiönäytöstä.
Nimiösivulla myös: Laboratory of Inorganic Chemistry, Department of Chemistry, Faculty of Science, University of Helsinki, Finland.

identifier

propertyID: FI-FENNI value: 1024994
propertyID: FI-MELINDA value: 006210529
propertyID: skl value: fx1024994

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9789521088070

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Fennica

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Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

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1 PDF-tiedosto (68 s.)

P60048

<http://rdaregistry.info/termList/RDACarrierType/1018>

P60050

<http://rdaregistry.info/termList/RDAMediaType/1003>

publication

location: Helsinki organizer: Helsingin yliopisto

publisher

Helsingin yliopisto

url

Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

Instances

Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors

Atomic layer deposition of groups 4 and 5 transition metal oxide thin films : focus on heteroleptic precursors