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Atomic layer deposition of binary and ternary lead and bismuth oxide thin films
URI:
http://urn.fi/URN:NBN:fi:bib:me:W00556575900
author
Harjuoja, Jenni
contributor
Teknillinen korkeakoulu. Epäorgaanisen ja analyyttisen kemian laboratorio
inLanguage
en
isPartOf
Fennica
name
Atomic layer deposition of binary and ternary lead and bismuth oxide thin films
P60049
<http://rdaregistry.info/termList/RDAContentType/1020>
Instances
-
2007 : Teknillinen korkeakoulu
Atomic layer deposition of binary and ternary lead and bismuth oxide thin films
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00556575901
description
Julkaistu myös verkkoaineistona
isPartOf
Fennica
Inorg. chem. publ. ser
name
Atomic layer deposition of binary and ternary lead and bismuth oxide thin films
View this in Finna
Atomic layer deposition of binary and ternary lead and bismuth oxide thin films
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00556575900
datePublished
2007
description
Kansi- ja selkänimeke: Atomic layer deposition of binary and ternary lead and bismuth thin films.
kuvitettu
Tiivistelmä ja 5 erip.
identifier
propertyID:
FI-FENNI
value:
859265
propertyID:
FI-MELINDA
value:
005565759
propertyID:
skl
value:
fx859265
isbn
9789512287024
9789512287031
isPartOf
Fennica
Inorg. chem. publ. ser
name
Atomic layer deposition of binary and ternary lead and bismuth oxide thin films
numberOfPages
59, [44] sivu
P60048
<http://rdaregistry.info/termList/RDACarrierType/1049>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1007>
publication
location:
Espoo
organizer:
Teknillinen korkeakoulu
publisher
Teknillinen korkeakoulu
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