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Atomic layer deposition of high permittivity oxides : film growth and in situ studies
URI:
http://urn.fi/URN:NBN:fi:bib:me:W00531124400
about
ohutkalvot
author
Rahtu, Antti
inLanguage
en
isPartOf
Fennica
name
Atomic layer deposition of high permittivity oxides : film growth and in situ studies
P60049
<http://rdaregistry.info/termList/RDAContentType/1020>
Instances
-
-
2002 : A. Rahtu
2002 : Helsingin yliopisto, e-book
Atomic layer deposition of high permittivity oxides : film growth and in situ studies
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00531124401
description
Julkaistu myös verkkoaineistona
isPartOf
Fennica
name
Atomic layer deposition of high permittivity oxides : film growth and in situ studies
Atomic layer deposition of high permittivity oxides : film growth and in situ studies
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00657085801
description
Myös painettuna (ISBN 952-91-4999-9)
isPartOf
Fennica
name
Atomic layer deposition of high permittivity oxides : film growth and in situ studies
View this in Finna
Atomic layer deposition of high permittivity oxides : film growth and in situ studies
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00531124400
datePublished
2002
description
kuvitettu
Tiivistelmä ja 10 erip. - Nimiösivulla myös: Laboratory of Inorganic Chemistry, Department of Chemistry, Faculty of Science, University of Helsinki
identifier
propertyID:
FI-FENNI
value:
715732
propertyID:
FI-MELINDA
value:
005311244
propertyID:
skl
value:
fx715732
isbn
9521006463
9529149999
isPartOf
Fennica
name
Atomic layer deposition of high permittivity oxides : film growth and in situ studies
numberOfPages
69, [67] sivu
P60048
<http://rdaregistry.info/termList/RDACarrierType/1049>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1007>
publication
location:
Helsinki
organizer:
A. Rahtu
publisher
A. Rahtu
View this in Finna
Atomic layer deposition of high permittivity oxides : film growth and in situ studies
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00657085800
bookFormat
<http://schema.org/EBook>
datePublished
2002
description
Kuvailun perusta: Nimeke nimiönäytöstä.
Tekstiä
Tiivistelmäosa. - Nimiönäytöllä myös: Laboratory of Inorganic Chemistry, Department of Chemistry, Faculty of Science, University of Helsinki
identifier
propertyID:
FI-FENNI
value:
711878
propertyID:
FI-MELINDA
value:
006570858
propertyID:
skl
value:
fx711878
isbn
9521006463
isPartOf
Fennica
name
Atomic layer deposition of high permittivity oxides : film growth and in situ studies
P60048
<http://rdaregistry.info/termList/RDACarrierType/1018>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1003>
publication
location:
Helsinki
organizer:
Helsingin yliopisto
publisher
Helsingin yliopisto
url
<http://ethesis.helsinki.fi/julkaisut/mat/kemia/vk/rahtu/>
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