Atomic layer deposition of high-k dielectrics from novel cyclopentadienyl-type precursors

Atomic layer deposition of high-k dielectrics from novel cyclopentadienyl-type precursors

datePublished

• 2006

description

• kuvitettu
• Tiivistelmä ja 9 erip.

identifier

• propertyID: FI-FENNI value: 831396
• propertyID: FI-MELINDA value: 005123671
• propertyID: skl value: fx831396

isbn

• 9512281694

isPartOf

• Fennica
• Inorganic chemistry publication series

name

• Atomic layer deposition of high-k dielectrics from novel cyclopentadienyl-type precursors

numberOfPages

• 72, [77] sivu

P60048

• <http://rdaregistry.info/termList/RDACarrierType/1049>

P60050

• <http://rdaregistry.info/termList/RDAMediaType/1007>

publication

• location: Espoo organizer: Helsinki University of Technology, Laboratory of Inorganic and Analytical Chemistry

publisher

• Helsinki University of Technology, Laboratory of Inorganic and Analytical Chemistry