Laser processing of high dose ion implanted Si : the solid phase regime

Laser processing of high dose ion implanted Si : the solid phase regime

datePublished

• 1982

description

• kuvitettu

identifier

• propertyID: FI-FENNI value: 801791
• propertyID: FI-MELINDA value: 000960400
• propertyID: skl value: f20050712

isPartOf

• Fennica

name

• Laser processing of high dose ion implanted Si : the solid phase regime

numberOfPages

• 2 mikrokorttia (xix, 120 s.)

P60048

• <http://rdaregistry.info/termList/RDACarrierType/1022>

P60050

• <http://rdaregistry.info/termList/RDAMediaType/1002>

publication

• location: Ann Arbor, Mich. organizer: University Microfilms International

publisher

• University Microfilms International