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Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations
URI:
http://urn.fi/URN:NBN:fi:bib:me:W00038790200
about
ohutkalvot
author
Alén, Petra
inLanguage
en
isPartOf
Fennica
name
Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations
P60049
<http://rdaregistry.info/termList/RDAContentType/1020>
Instances
-
-
2005 : Helsingin yliopisto, e-book
2005 : Petra Alén
Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00657145001
description
Myös painettuna (ISBN 952-91-8796-3)
isPartOf
Fennica
name
Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations
Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00038790201
description
Julkaistu myös verkkoaineistona
isPartOf
Fennica
name
Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations
View this in Finna
Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00657145000
bookFormat
<http://schema.org/EBook>
datePublished
2005
description
Kuvailun perusta: Nimeke nimiönäytöstä.
Tekstiä
Tiivistelmäosa. - Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki
identifier
propertyID:
FI-FENNI
value:
799666
propertyID:
FI-MELINDA
value:
006571450
propertyID:
skl
value:
fx799666
isbn
9521024976
isPartOf
Fennica
name
Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations
P60048
<http://rdaregistry.info/termList/RDACarrierType/1018>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1003>
publication
location:
Helsinki
organizer:
Helsingin yliopisto
publisher
Helsingin yliopisto
url
<http://ethesis.helsinki.fi/julkaisut/mat/kemia/vk/alen/>
View this in Finna
Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00038790200
datePublished
2005
description
kuvitettu
Selkänimeke: PhD thesis 2005.
Tiivistelmä ja 5 erip. - Nimiösivulla myös: Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki
identifier
propertyID:
FI-FENNI
value:
806692
propertyID:
FI-MELINDA
value:
000387902
propertyID:
skl
value:
fx806692
isbn
9521024976
9529187963
isPartOf
Fennica
name
Atomic layer deposition of TaN, NbN, and MoN films for Cu metallizations
numberOfPages
72, [41] sivu
P60048
<http://rdaregistry.info/termList/RDACarrierType/1049>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1007>
publication
location:
Helsinki
organizer:
Petra Alén
publisher
Petra Alén
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