Deposition of binary and ternary oxide thin films of trivalent metals by atomic layer epitaxy

Deposition of binary and ternary oxide thin films of trivalent metals by atomic layer epitaxy

datePublished

• 2001

description

• kuvitettu
• Tiivistelmä ja 7 erip. - Nimiösivulla myös: Department of Chemical Technology. Laboratory of Inorganic and Analytical Chemistry. Teknillinen korkeakoulu. Kemian tekniikan osasto. Epäorgaanisen ja analyyttisen kemian laboratorio.

identifier

• propertyID: FI-FENNI value: 698820
• propertyID: FI-MELINDA value: 000243728
• propertyID: skl value: fx698820

isbn

• 9512257475

isPartOf

• Fennica
• Inorganic chemistry publication series / Helsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical Chemistry

name

• Deposition of binary and ternary oxide thin films of trivalent metals by atomic layer epitaxy

numberOfPages

• 57, [53] s.

P60048

• <http://rdaregistry.info/termList/RDACarrierType/1049>

P60050

• <http://rdaregistry.info/termList/RDAMediaType/1007>

publication

• location: Espoo organizer: Teknillinen korkeakoulu

publisher

• Teknillinen korkeakoulu