Exploiting atomic layer epitaxy thin film deposition technique in solid-state chemical sensor applications

Exploiting atomic layer epitaxy thin film deposition technique in solid-state chemical sensor applications

datePublished

• 1999

description

• kuvitettu
• Tiivistelmä ja 9 erip.

identifier

• propertyID: FI-FENNI value: 653350
• propertyID: FI-MELINDA value: 000208437
• propertyID: skl value: fx653350

isbn

• 9512247771

isPartOf

• Fennica

name

• Exploiting atomic layer epitaxy thin film deposition technique in solid-state chemical sensor applications

numberOfPages

• 80, [57] s.

P60048

• <http://rdaregistry.info/termList/RDACarrierType/1049>

P60050

• <http://rdaregistry.info/termList/RDAMediaType/1007>

publication

• location: Espoo organizer: Helsinki University of Technology, Department of Chemical Technology

publisher

• Helsinki University of Technology, Department of Chemical Technology