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Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
URI:
http://urn.fi/URN:NBN:fi:bib:me:W01148219400
about
atomikerroskasvatus
ohutkalvot
plasmatekniikka
polymeerit
sinkkioksidi
author
Napari, Mari
contributor
Jyväskylän yliopisto. Fysiikan laitos
inLanguage
en
isPartOf
Fennica
name
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
P60049
<http://rdaregistry.info/termList/RDAContentType/1020>
Instances
-
-
-, e-book
2017 : Jyväskylän yliopisto
2017 : Jyväskylän yliopisto, e-book
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
URI:
http://urn.fi/URN:NBN:fi:bib:me:I01148219401
isbn
9789513970987
isPartOf
Fennica
Research report / Department of Physics, University of Jyväskylä
name
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
URI:
http://urn.fi/URN:NBN:fi:bib:me:I01205933101
isbn
9789513970994
isPartOf
Fennica
Research report / Department of Physics, University of Jyväskylä
name
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
URI:
http://urn.fi/URN:NBN:fi:bib:me:I01205933102
bookFormat
<http://schema.org/EBook>
isPartOf
Fennica
Research report / Department of Physics, University of Jyväskylä
name
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
url
<http://urn.fi/URN:ISBN:978-951-39-7099-4>
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
URI:
http://urn.fi/URN:NBN:fi:bib:me:I01205933100
datePublished
2017
description
Artikkeliväitöskirjan yhteenveto-osa ja 3 eripainosta.
kuvitettu
Nimiösivulla myös: Academic Dissertation for the Degree of Doctor of Philosophy.
isbn
9789513970987
isPartOf
Fennica
Research report / Department of Physics, University of Jyväskylä
name
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
numberOfPages
97 sivua, 44 sivua useina numerointijaksoina
P60048
<http://rdaregistry.info/termList/RDACarrierType/1049>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1007>
publication
location:
Jyväskylä
organizer:
Jyväskylän kasvatusopillinen korkeakoulu Jyväskylän yliopisto
publisher
Jyväskylän kasvatusopillinen korkeakoulu
Jyväskylän yliopisto
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
URI:
http://urn.fi/URN:NBN:fi:bib:me:I01148219400
bookFormat
<http://schema.org/EBook>
datePublished
2017
description
Artikkeliväitöskirjan yhteenveto-osa.
isbn
9789513970994
isPartOf
Fennica
Research report / Department of Physics, University of Jyväskylä
name
Low-temperature thermal and plasma-enhanced atomic layer deposition of metal oxide thin films
numberOfPages
1 verkkoaineisto (97 sivua)
P60048
<http://rdaregistry.info/termList/RDACarrierType/1018>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1003>
<http://rdaregistry.info/termList/RDAMediaType/1007>
publication
location:
Jyväskylä
organizer:
Jyväskylän kasvatusopillinen korkeakoulu Jyväskylän yliopisto
publisher
Jyväskylän kasvatusopillinen korkeakoulu
Jyväskylän yliopisto
url
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