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Cryogenic deep reactive ion etching of silicon micro and nanostructures
URI:
http://urn.fi/URN:NBN:fi:bib:me:W00526884700
author
Sainiemi, Lauri
contributor
Teknillinen korkeakoulu. Mikro- ja nanotekniikan laitos
inLanguage
en
isPartOf
Fennica
name
Cryogenic deep reactive ion etching of silicon micro and nanostructures
P60049
<http://rdaregistry.info/termList/RDAContentType/1020>
Instances
-
2009 : Teknillinen korkeakoulu
Cryogenic deep reactive ion etching of silicon micro and nanostructures
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00526884701
description
Myös verkkoaineistona ISBN 978-951-22-9867-9 (PDF)
isPartOf
Fennica
TKK dissertations
name
Cryogenic deep reactive ion etching of silicon micro and nanostructures
View this in Finna
Cryogenic deep reactive ion etching of silicon micro and nanostructures
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00526884700
datePublished
2009
description
Artikkeliväitöskirjan yhteenveto-osa ja 7 eripainosta.
kuvitettu
identifier
propertyID:
FI-FENNI
value:
918050
propertyID:
FI-MELINDA
value:
005268847
propertyID:
skl
value:
fx918050
isbn
9789512298662
isPartOf
Fennica
TKK dissertations
name
Cryogenic deep reactive ion etching of silicon micro and nanostructures
numberOfPages
61, [89] sivu
P60048
<http://rdaregistry.info/termList/RDACarrierType/1049>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1007>
publication
location:
Espoo
organizer:
Teknillinen korkeakoulu
publisher
Teknillinen korkeakoulu
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