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Development of negative ion sources for accelerator, fusion and semiconductor manufacturing applications
URI:
http://urn.fi/URN:NBN:fi:bib:me:W00336122300
author
Hahto, Sami
inLanguage
en
isPartOf
Fennica
name
Development of negative ion sources for accelerator, fusion and semiconductor manufacturing applications
P60049
<http://rdaregistry.info/termList/RDAContentType/1020>
Instances
2003 : Jyväskylän kasvatusopillinen korkeakoulu
View this in Finna
Development of negative ion sources for accelerator, fusion and semiconductor manufacturing applications
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00336122300
datePublished
2003
description
kuvitettu
identifier
propertyID:
FI-FENNI
value:
743376
propertyID:
FI-MELINDA
value:
003361223
propertyID:
skl
value:
fx743376
isbn
9513915743
isPartOf
Fennica
Research report
name
Development of negative ion sources for accelerator, fusion and semiconductor manufacturing applications
numberOfPages
129, [1] s.
P60048
<http://rdaregistry.info/termList/RDACarrierType/1049>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1007>
publication
location:
Jyväskylä
organizer:
Jyväskylän kasvatusopillinen korkeakoulu Jyväskylän yliopisto
publisher
Jyväskylän kasvatusopillinen korkeakoulu
Jyväskylän yliopisto
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