Dry etching process development for submicron and nanometer semiconductor devices

Dry etching process development for submicron and nanometer semiconductor devices

datePublished

• 1993

description

• kuvitettu

identifier

• propertyID: FI-FENNI value: 346675
• propertyID: FI-MELINDA value: 000756140

isbn

• 9512216736

isPartOf

• Fennica
• Report

name

• Dry etching process development for submicron and nanometer semiconductor devices

numberOfPages

• 26 s.

P60048

• <http://rdaregistry.info/termList/RDACarrierType/1049>

P60050

• <http://rdaregistry.info/termList/RDAMediaType/1007>

publication

• location: Otaniemi organizer: Teknillinen korkeakoulu

publisher

• Teknillinen korkeakoulu