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The homoepitaxial growth of silicon by adapting the UHV/CVD-method
URI:
http://urn.fi/URN:NBN:fi:bib:me:W00018463900
author
Jokinen, K
inLanguage
en
isPartOf
Fennica
name
The homoepitaxial growth of silicon by adapting the UHV/CVD-method
P60049
<http://rdaregistry.info/termList/RDAContentType/1020>
Instances
1994 : Turun yliopisto
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The homoepitaxial growth of silicon by adapting the UHV/CVD-method
URI:
http://urn.fi/URN:NBN:fi:bib:me:I00018463900
datePublished
1994
description
kuvitettu
identifier
propertyID:
FI-FENNI
value:
375822
propertyID:
FI-MELINDA
value:
000184639
propertyID:
skl
value:
fx375822
isbn
9512903075
isPartOf
Fennica
Report series / University of Turku, Department of Applied Physics. R
name
The homoepitaxial growth of silicon by adapting the UHV/CVD-method
numberOfPages
15, [1] lehteƤ
P60048
<http://rdaregistry.info/termList/RDACarrierType/1049>
P60050
<http://rdaregistry.info/termList/RDAMediaType/1007>
publication
location:
Turku
organizer:
Turun yliopisto
publisher
Turun yliopisto
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