{
  "@context": {
    "@vocab": "http://schema.org/",
    "rdau": "http://rdaregistry.info/Elements/u/",
    "skos": "http://www.w3.org/2004/02/skos/core#",
    "skos:prefLabel": {
      "@container": "@language"
    }
  },
  "@graph": [
    {
      "@id": "http://urn.fi/URN:NBN:fi:au:pn:000050788",
      "@type": "Person",
      "name": "Lietoila, Arto"
    },
    {
      "@id": "http://urn.fi/URN:NBN:fi:bib:me:W00096040000",
      "author": {
        "@id": "http://urn.fi/URN:NBN:fi:au:pn:000050788"
      },
      "name": "Laser processing of high dose ion implanted Si : the solid phase regime"
    },
    {
      "@id": "http://urn.fi/URN:NBN:fi:bib:me:W00129756200",
      "contributor": {
        "@id": "http://urn.fi/URN:NBN:fi:au:pn:000050788"
      },
      "name": "11th Nordic Semiconductor Meeting : Espoo, Finland, June 11-13, 1984"
    }
  ]
}