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<http://urn.fi/URN:NBN:fi:bib:me:W00016815900> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Growth of ZrO[sub 2] and CrO[sub x] on high surface area oxide supports by atomic layer epitaxy" .

<http://urn.fi/URN:NBN:fi:bib:me:W00016833100> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Analysis and environmental fate of EDTA and DTPA" .

<http://urn.fi/URN:NBN:fi:bib:me:W00019490300> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Studies on precursors and their application in the atomic layer epitaxy growth of thin films for electroluminescent devices" .

<http://urn.fi/URN:NBN:fi:bib:me:W00020843700> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Exploiting atomic layer epitaxy thin film deposition technique in solid-state chemical sensor applications" .

<http://urn.fi/URN:NBN:fi:bib:me:W00024372800> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Deposition of binary and ternary oxide thin films of trivalent metals by atomic layer epitaxy" .

<http://urn.fi/URN:NBN:fi:bib:me:W00084055500> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Structural features of Selenium(IV) oxoanion compounds",
        "Structural features of selenium(IV) oxoanion compounds" .

<http://urn.fi/URN:NBN:fi:bib:me:W00084055600> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Thermoanalytical techniques in the study of inorganic materials" .

<http://urn.fi/URN:NBN:fi:bib:me:W00393683800> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Inorg. chem. publ. ser",
        "Inorganic chemistry publication series",
        "Inorganic chemistry publication series / Aalto University School of Science and Technology",
        "Inorganic chemistry publication series / Helsinki University of Technology",
        "Inorganic chemistry publication series / Helsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical Chemistry",
        "Inorganic chemistry publications series" .

<http://urn.fi/URN:NBN:fi:bib:me:W00512367100> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Atomic layer deposition of high-k dielectrics from novel cyclopentadienyl-type precursors" .

<http://urn.fi/URN:NBN:fi:bib:me:W00531094200> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Control of copper and iron oxidation states in some triple- and double-perovskite oxides" .

<http://urn.fi/URN:NBN:fi:bib:me:W00533291600> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Synthesis and characterization of some Ruddlesden-Popper and spinel type oxides" .

<http://urn.fi/URN:NBN:fi:bib:me:W00556575900> schema:contributor <http://urn.fi/URN:NBN:fi:au:cn:52790A> ;
    schema:name "Atomic layer deposition of binary and ternary lead and bismuth oxide thin films" .

<http://urn.fi/URN:NBN:fi:au:cn:52790A> a schema:Organization ;
    schema:name "Teknillinen korkeakoulu. Epäorgaanisen ja analyyttisen kemian laboratorio" .

