Development of atomic layer deposition processes for nanotechnology applications

URI: http://urn.fi/URN:NBN:fi:bib:me:W01222990400
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  • Development of atomic layer deposition processes for nanotechnology applications
P60049

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Development of atomic layer deposition processes for nanotechnology applications

URI: http://urn.fi/URN:NBN:fi:bib:me:I01222990401
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  • Development of atomic layer deposition processes for nanotechnology applications
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Development of atomic layer deposition processes for nanotechnology applications

URI: http://urn.fi/URN:NBN:fi:bib:me:I01222990400
datePublished
  • 2018
description
  • Artikkeliväitöskirjan yhteenveto-osa ja 5 eripainosta.
identifier
  • propertyID: FI-MELINDA value: 012229904
isbn
  • 9789526078588
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  • Development of atomic layer deposition processes for nanotechnology applications
numberOfPages
  • x, 49 sivua, 29 sivua useina numerointijaksoina
P60048
P60050
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  • location: Helsinki organizer: Aalto-yliopisto
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