Substrate heating effects in CO[sub]2 laser annealing of ion-implanted silicon

Substrate heating effects in CO[sub]2 laser annealing of ion-implanted silicon

datePublished

• 1982

description

• kuvitettu
• Submitted for publ. in a periodical.

identifier

• propertyID: FI-FENNI value: 8921
• propertyID: FI-MELINDA value: 000621001
• propertyID: skl value: f830959

isPartOf

• Fennica
• Report / Helsinki University of Technology. Laboratory of Mineral Processing : A

name

• Substrate heating effects in CO[sub]2 laser annealing of ion-implanted silicon

numberOfPages

• [5], 4, [6] s.

P60048

• <http://rdaregistry.info/termList/RDACarrierType/1049>

P60050

• <http://rdaregistry.info/termList/RDAMediaType/1007>

publication

• location: Hki organizer: Teknillinen korkeakoulu

publisher

• Teknillinen korkeakoulu